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Beilstein J. Nanotechnol. 2015, 6, 2069–2077, doi:10.3762/bjnano.6.211
Figure 1: (a) Schematic diagram of the plasmonic structures for focusing based on elliptical slits. Orientati...
Figure 2: Calculated profiles of the E-field intensity |E|2 in x-direction for structures with different rati...
Figure 3: Comparison of E-field intensity distribution under x-polarization between calculation and NSOM meas...
Figure 4: Comparison of E-field intensity distribution under x-polarization between calculation and NSOM meas...
Figure 5: Comparison of E-field intensity distribution under x-polarization between calculation and NSOM meas...
Figure 6: NSOM-measured E-field intensity profiles along x- and y-directions for the case of σ = 0.8 at z = 3...
Figure 7: Intensity distribution of the E·x component in the x–z plane under x-polarization for (a) σ = 0.7; ...
Figure 8: Influence of stigmation of FIB for the special case of σ = 1 (circular slits). (a) AFM probed topog...